铝热氧化形成的氧化铝薄膜的结构和形貌( Structure and morphology of aluminium-oxide films formed by thermal oxidation of aluminium )

LPH Jeurgens WG Sloof FD Tichelaar EJ Mittemeijer Experimental/ aluminium aluminium compounds crystallisation electron microscopy oxidation surface diffusion thin films X-ray photoelectron spectra/ morphology structure aluminium-oxide films dry thermal oxidation X-ray photoelectron spectroscopy high resolution electron microscopy island-by-layer growth mechanism lateral diffusion oxygen mobility amorphous oxide film temperature effects amorphous crystalline transformation electron micrographs 1.33times10 -4 Pa 373 to 773 K Al-Al 2O 3 Al/ A6855 Thin film growth, structure, and epitaxy A7960G Photoelectron spectra of composite surfaces A6822 Surface diffusion, segregation and interfacial compound formation A6140 Structure of amorphous and polymeric materials/ pressure 1.33E-04 Pa temperature 3.73E+02 to 7.73E+02 K/ Al-Al2O3/int Al2O3/int Al2/int Al/int O3/int O/int Al2O3/bin Al2/bin Al /bin O3/bin O/bin Al /el Al/sur Al /el

用X射线光电子能谱和高分辨电子显微术研究了在氧分压为1.33×10 4 Pa,373-773 K温度范围内,Al(4 3 1）裸衬底干热氧化生长的氧化铝薄膜的结构和形貌。裸Al衬底的初始氧化是通过层岛生长机制进行的，包括流动氧物种在裸Al衬底表面的横向扩散。在低温(T573 K）下，氧物种的迁移率非常低，并且形成相对均匀、厚度有限的非晶氧化膜。X射线光电子能谱分析确定了在这些薄膜的最表面存在一种表面氧化物。在较高温度(T>573K)下，形成厚度较不均匀的非晶态氧化膜，并逐渐转变为晶态的Al2O3。在此温度下,出现了非晶向Al2O3过渡的氧化物相.

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