真空冷喷涂纳米结构TiN镀层的电学和力学性能( Electrical and mechanical properties of nano-structured TiN coatings deposited by vacuum cold spray )

YY Wang Y Liu CJ Li GJ Yang K Kusumoto Experimental/ crystal microstructure electrical resistivity fracture toughness indentation microhardness nanofabrication nanoparticles porosity scanning electron microscopy spray coatings titanium compounds vacuum deposition X-ray diffraction/ electrical properties nanostructured coatings vacuum cold spray deposition powder microstructure scanning electron microscopy X-ray diffraction porosity pore distribution adsorption-desorption method microhardness fracture toughness microindentation sheet resistance electrical resistivity four-point probe method hardness mechanical properties temperature 293 K to 298 K TiN/ A8140N Fatigue, embrittlement, and fracture A8116 Methods of nanofabrication and processing A7220 Electrical conductivity phenomena in semiconductors and insulators A7280S Electrical conductivity of insulators A6480G Microstructure A6220M Fatigue, brittleness, fracture, and cracks/ temperature 2.93E+02 to 2.98E+02 K/ TiN/bin Ti/bin N/bin

采用真空冷喷涂(VCS)工艺在室温下制备了纳米级氮化钛（TiN）涂层。用扫描电镜和X射线衍射分析了粉末和涂层的显微结构。采用N2吸附-解吸法测定了VCS TiN涂层的孔隙率和孔径分布。采用微压痕技术评价了涂层的显微硬度和断裂韧性。用四点探针法表征了涂层的薄层电阻和电阻率。结果表明，随着涂层厚度的增加，涂层的薄层电阻从13565下降到127Ω。最小电阻率为1.8×103Ωm。高孔隙率为58.3～67.6%的VCS TiN涂层的硬度较低，为279～490HV，断裂韧性较好，约为3.12MPam1/2。

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